How can fabs measure wafer temperatures accurately when infrared lamps heat the wafer? A centralised system measures temperature to help improve process consistency.
Advanced Energy has launched its Centra Smart Hub, a wafer temperature measurement system that works alongside Remote Smart Sensors (RSS) to allow accurate real time temperature measurements. The system is designed for semiconductor processes such as Rapid Thermal Annealing (RTA) and Epitaxy which use IR lamps to heat silicon and silicon carbide wafers.
Conventional IR pyrometers can be affected by the IR lamps. As both components emit IR radiation the sensor can become overwhelmed by the signal causing issues to obtain an accurate reading. The system uses wavelengths of 3.3µm or 5.2µm to reduce this effect.
The system can measure temperatures up to 1700°C. It can improve the accuracy of the measurement by up to 40%, when compared to conventional solutions. This can help semiconductors to provide consistent wafer temperatures.
The system uses a hub and spoke design. The Smart Hub is mounted within an instrumentation rack and the RSS units are mounted directly onto the process chamber. This can measure multiple points across the wafer. The sensors can also work in ambient temperatures up to 60°C.
The hub offers EtherCAT and Ethernet connectivity. This gives manufacturers the ability to integrate their temperature measurement system.
“The company’s new Centra Smart Hub and Remote Smart Sensors deliver industry-leading performance to meet today’s process requirements along with a new architecture for semiconductor processing systems,” says Juergen Braun, Executive Vice President of Plasma Power at Advanced Energy.
Click here for the official announcement.
