HomeElectronics NewsPULS Introduces New Low Power Field-Mounted Power Supplies

PULS Introduces New Low Power Field-Mounted Power Supplies

PULS has expanded its FIEPOS field power supply family with new low-power, field-mounted units designed to deliver reliable 24 V DC power directly to decentralised industrial automation systems.

PULS Introduces New Low Power Field-Mounted Power Supplies
PULS Introduces New Low Power Field-Mounted Power Supplies

PULS, a global leader in industrial DC power supply solutions, has expanded its FIEPOS (Field Power Supply) product family with new low-power field-mounted power supplies. Designed for decentralised industrial automation and intralogistics applications, the new single-phase units complement the existing FIEPOS 360 W and 600 W models.

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Available in 100 W and 200 W power classes, the new supplies provide reliable 24 V DC power close to sensors, actuators, distributed I/O devices and smaller control systems. Their compact design and IP65/IP67 protection allow installation close to the machine, reducing cabinet space, cable runs and installation costs.

The new units are engineered for demanding industrial environments, offering efficiency of up to 95.6% and a service life exceeding 200,000 hours. Selected models also feature IO-Link communication for enhanced diagnostics, remote monitoring and predictive maintenance.

The expanded FIEPOS portfolio supports the growing shift toward decentralised automation architectures in conveyor systems, warehouse automation and material-handling applications. By placing power supplies directly in the field, manufacturers can simplify machine design, improve scalability and accelerate system commissioning.

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Overall, PULS says the new low-power FIEPOS supplies provide a flexible and reliable solution for modern industrial automation systems where efficient, decentralised power delivery is required.

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T Pavani
T Pavani
T Pavani is a Tech Journalist at ElectronicsForU.com with a deep interest in embedded systems, IoT, robotics, AI/ML, VLSI, and emerging technologies.

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