A new alignment platform combines multi-axis nanopositioning, motion control and optical feedback to improve throughput for demanding photonics manufacturing, testing and assembly workflows at scale.
PI (Physik Instrumente) has introduced the F-572 High-Performance 3- to 6-Axis Photonics Alignment System, designed to accelerate active alignment for high-throughput photonics manufacturing, assembly, testing and related applications.
The integrated platform combines precision goniometers, linear nanopositioning stages, magnetic direct-drive technology, high-resolution optical encoder feedback and a preconfigured ACS-based alignment controller. It provides a compact, industrial-ready system for photonics applications with payloads of up to 2 kg, including advanced packaging, LiDAR and multichip-level testing.
A user-adjustable magnetic counterbalance on the Z-axis is intended to keep motor currents and heat to a minimum. The F-572 provides 60 mm of linear travel in the X, Y and Z axes, while three precision goniometers offer rotation ranges of up to 17 degrees.
High-speed magnetic direct drives enable linear velocities of up to 500 mm/s, while the goniometers support angular velocities of up to 10 degrees/s. Minimum incremental motion is specified at 5 nm for linear movement and 5 µrad for angular movement, with bidirectional repeatability of 150 nm and 25 µrad.
Embedded Fast Multi-Channel Alignment routines support rapid area scans and gradient searches, helping reduce alignment times and increase manufacturing throughput. The alignment controller includes TCP/IP and EtherCAT interfaces, advanced alignment routines and user-friendly software. An optional ultrafast Pilightning algorithm is available for accelerated first-light search applications.
The system is aimed at industries and processes including fibre alignment, photonics test and assembly, optical component assembly and automated photonic wafer testing and probing. Its combination of motion precision, control and automated alignment is intended to support faster, repeatable workflows where optical components must be positioned accurately.
